26 June 2003 High-power excimer lasers for 157-nm lithography
Author Affiliations +
Abstract
According to the ITRS-Roadmap, the 157 nm wavelength of the F2-laser is the most likely solution to extend the optical lithography for production of ICs with critical dimensions below 70 nm down to the 50 nm node. This requires high power, high repetition rate F2-lasers with highest reliability, operating in the power range of more than 40 W at repetition rates of at least 4 kHz. In the recent three years strong efforts have been done in order to investigate and develop all kind of materials, technologies and devices which are necessary to introduce the 157 nm lithography for high volume mass production in the year 2004/5. Towards this road Lambda Physik has developed a 4 kHz line selected F2-laser with an output power of 20 W meeting the spectral performance requirements and therefore suitable for pilot 157 nm scanner. In order to reach an output power of 40 W under retention of the required spectral performance, we are now concentrating on the output power increase which comprises a new tube design, a modified discharge and charging circuit. In this paper the laser performance data which has been verified and measured by existing and improved 157 nm metrology as well as new findings on general F2-laser properties at high repetition rate, high power operation will be discussed. The prototype 4 kHz line selected F2-laser gains benefit from the outstanding long term reliability of the resonator optics. The field proven NovaLine F2020 optics modules are only slightly modified for 4 kHz operation. Lambda Physik will present appropriate reliability data which had been confirmed from field application showing laser tube and optical modules life times passing 5 Bio shots at 2 kHz repetition rate operation.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stefan Spratte, Stefan Spratte, Frank Voss, Frank Voss, Igor Bragin, Igor Bragin, Elko Bergmann, Elko Bergmann, Norbert Niemoeller, Norbert Niemoeller, Tamas Nagy, Tamas Nagy, Ulrich Rebhan, Ulrich Rebhan, Andreas Targsdorf, Andreas Targsdorf, Rainer Paetzel, Rainer Paetzel, Sergei V. Govorkov, Sergei V. Govorkov, Gongxue Hua, Gongxue Hua, } "High-power excimer lasers for 157-nm lithography", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485345; https://doi.org/10.1117/12.485345
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT


Back to Top