Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

Bruno M. La Fontaine; Jan Hauschild; Mircea V. Dusa; Alden Acheta; Eric M. Apelgren; Marc Boonman; Jouke Krist; Ashok Khathuria; Harry J. Levinson; Anita Fumar-Pici; Marco Pieters

doi:10.1117/12.485535

26 June 2003 Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

Bruno M. La Fontaine, Jan Hauschild, Mircea V. Dusa, Alden Acheta, Eric M. Apelgren, Marc Boonman, Jouke Krist, Ashok Khathuria, Harry J. Levinson, Anita Fumar-Pici, Marco Pieters

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485535
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A Phase-Grating Focus Monitor (PGFM) is used to assess the focus control of a state-of-the-art lithography scanner (TWINSCAN AT:1100) over substrate topography. The starting wafer flatness quality is found to be critical in minimizing the overall defocus distribution. In fact, on nearly all wafers, the most significant contributor to defocus across the wafer was the small-scale topography. Results obtained over programmed topography, created by etching various patterns into silicon, are found to agree well with the simulated defocus behavior based on the measurement of the wafer surface obtained on the scanner metrology stage. Finally, we report on preliminary focus control results over realistic device-type substrate topography, involving thin-film and polish effects.

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Bruno M. La Fontaine, Jan Hauschild, Mircea V. Dusa, Alden Acheta, Eric M. Apelgren, Marc Boonman, Jouke Krist, Ashok Khathuria, Harry J. Levinson, Anita Fumar-Pici, and Marco Pieters "Study of the influence of substrate topography on the focusing performance of advanced lithography scanners", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485535

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