15 July 2003 Copy result exactly using EB-Scope technology
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Abstract
This paper presents the concept of "copy result exactly" frameworks using EB-SCOPE technology which must be a powerful tool for coping the best process condition producing ever lasting good contact and via hole.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keizo Yamada, Takeo Ushiki, Yousuke Itagaki, Robert Newcomb, "Copy result exactly using EB-Scope technology", Proc. SPIE 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing, (15 July 2003); doi: 10.1117/12.485238; https://doi.org/10.1117/12.485238
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KEYWORDS
Semiconducting wafers

Process control

Silica

Silicon

Electron beams

Etching

Yield improvement

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