PsmLint: bringing AltPSM benefits to the IC design stage

Pradiptya Ghosh; Chung-Shin Kang; Michael Sanie; Judy A. Huckabay

doi:10.1117/12.485253

10 July 2003 PsmLint: bringing AltPSM benefits to the IC design stage

Pradiptya Ghosh, Chung-Shin Kang, Michael Sanie, Judy A. Huckabay

Proceedings Volume 5042, Design and Process Integration for Microelectronic Manufacturing; (2003) https://doi.org/10.1117/12.485253
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

As we delve deeper into subwavelength design and manufacturing challenges and solutions, technologies such as Optical Proximity Correction (OPC) and Phase Shifting Masks (PSM) have become essential to reliabily produce advanced integrated circuits. Alternating PSM (altPSM) has demonstrated many recent successses as an effective means to this end. This paper lays the groundwork for defining the IC design components needed to meet altPSM-compliance requirements. The paper addresses the open question regarding whether we can take into account all the manufacturing requirements and come up with highly abstract manufacturing rules that can be applied to all IC design domains. The paper further proposes a solution with specific rules and algorithms needed to apply altPSM to transistor gate regions, and targeted to various domains of IC design such as verification or place and route. Examples include constraints for routers and placement tools, as well as sign-off rules that can be used by designers as well as by production engineres to fine-tune the process and yield for a given design structure. The usability of such a solution is then analyzed to take the practical aspects of IC design into consideration.

Citation Download Citation

Pradiptya Ghosh, Chung-Shin Kang, Michael Sanie, and Judy A. Huckabay "PsmLint: bringing AltPSM benefits to the IC design stage", Proc. SPIE 5042, Design and Process Integration for Microelectronic Manufacturing, (10 July 2003); https://doi.org/10.1117/12.485253

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