Paper
14 October 2003 Analysis challenges for reliability improvement in silicon micromachined devices
M. K. Radhakrishnan
Author Affiliations +
Proceedings Volume 5062, Smart Materials, Structures, and Systems; (2003) https://doi.org/10.1117/12.514722
Event: Smart Materials, Structures, and Systems, 2002, Bangalore, India
Abstract
Similar to silicon integrated circuits, the reliability improvement in MEMS devices starts with the very design and is a process involving all stages of manufacture and test. This process of building-in reliability is the resultant of various physical analyses to understand the failure mechanisms and to provide feedback to each stage for appropriate corrective actions. But, due to the structural uniqueness, the analysis of MEMS devices faces many challenges. Eventhough, a number of tools used for ICFA are being used for MEMS failure analysis, the methodology and application differs. An overview of the analysis issues for building-in reliability in MEMS devices is discussed.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. K. Radhakrishnan "Analysis challenges for reliability improvement in silicon micromachined devices", Proc. SPIE 5062, Smart Materials, Structures, and Systems, (14 October 2003); https://doi.org/10.1117/12.514722
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KEYWORDS
Microelectromechanical systems

Failure analysis

Reliability

Silicon

Scanning electron microscopy

Transmission electron microscopy

Etching

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