18 November 2003 Carbon nitride films synthesized by pulsed laser deposition with additional laser irradiation to plume
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540605
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
A carbon nitride film was synthesized by a pulsed laser deposition technique using an additional laser to irradiate the carbon plume. A highly oriented pyrolytic graphite target was ablated in a nitrogen atmosphere at a pressure of 0.1 torr. The optical emission intensities of ionic carbon and nitrogen from the carbon plume were increased by additional laser-irradiation. The ratio of N sp3-C bonds and nitrogen chemical content were also increased by the additional laser irradiation to the plume. The ratio of N sp3-C bonding and nitrogen content increased with additional laser irradiation at low but not high fluence from the ablating laser.
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Tatsuya Shinozaki, Toshihiko Ooie, Tetsuo Yano, "Carbon nitride films synthesized by pulsed laser deposition with additional laser irradiation to plume", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540605; https://doi.org/10.1117/12.540605
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