18 November 2003 Carbon nitride films synthesized by pulsed laser deposition with additional laser irradiation to plume
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540605
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
A carbon nitride film was synthesized by a pulsed laser deposition technique using an additional laser to irradiate the carbon plume. A highly oriented pyrolytic graphite target was ablated in a nitrogen atmosphere at a pressure of 0.1 torr. The optical emission intensities of ionic carbon and nitrogen from the carbon plume were increased by additional laser-irradiation. The ratio of N sp3-C bonds and nitrogen chemical content were also increased by the additional laser irradiation to the plume. The ratio of N sp3-C bonding and nitrogen content increased with additional laser irradiation at low but not high fluence from the ablating laser.
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Tatsuya Shinozaki, Tatsuya Shinozaki, Toshihiko Ooie, Toshihiko Ooie, Tetsuo Yano, Tetsuo Yano, } "Carbon nitride films synthesized by pulsed laser deposition with additional laser irradiation to plume", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540605; https://doi.org/10.1117/12.540605
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