Paper
18 November 2003 Experimental assessment of machining accuracy obtainable by femtosecond-laser surface structuring
Thomas Hoeche, Tino Petsch, David Ruthe, Klaus-Peter Zimmer, Frank Syrowatka, Frank Heyroth
Author Affiliations +
Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.541156
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
Surface replica films taken from fs-laser machined silicon wafers coated with a 20 nm thick layer of nickel are analyzed in an environmental scanning electron microscope. Electron-probe microanalysis on the replica film is used to assess the spatial distribution and elemental composition of debris.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas Hoeche, Tino Petsch, David Ruthe, Klaus-Peter Zimmer, Frank Syrowatka, and Frank Heyroth "Experimental assessment of machining accuracy obtainable by femtosecond-laser surface structuring", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.541156
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KEYWORDS
Silicon

Scanning electron microscopy

Silicon films

Electron microscopes

Semiconducting wafers

Semiconductor lasers

Nickel

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