18 November 2003 Fabrication of diffractive phase elements by F2-laser ablation of fused silica
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.541070
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
F2-laser ablation at 157 nm was used for generating sub-micron surface relief structures on fused silica to define binary diffractive phase elements (DPE). A pattern array of 128 x 128 pixels was excised using the F2 laser in combination with a high resolution processing system comprising of CaF2 beam-homogenization optics and a high-resolution Schwarzschild reflective objective. A square projection mask provided precise excisions in less than 10 x 10 μm2 spots, having sub-μm depths that were controlled by the laser fluence and the number of laser pulses to provide for the required phase delay between ablated and non-ablated pixels. Thus a diffractive phase element (DPE) optimized for first order in the UV spectral range was made. A four-level DPE design computed by the Iterative Fourier Transform Algorithm (IFTA) will be described for generating an arbitrary irradiation pattern without the point symmetry of a two level design.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Malte Schulz-Ruthenberg, Malte Schulz-Ruthenberg, Juergen Ihlemann, Juergen Ihlemann, Gerd Marowsky, Gerd Marowsky, Amir H. Nejadmalayeri, Amir H. Nejadmalayeri, Mi Li Ng, Mi Li Ng, Jianzhao Li, Jianzhao Li, Peter R. Herman, Peter R. Herman, } "Fabrication of diffractive phase elements by F2-laser ablation of fused silica", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.541070; https://doi.org/10.1117/12.541070
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