Laser-induced single step micro/nanopatterning

Dieter Baeuerle; Gerard Wysocki; Lars Landstroem; Johannes Klimstein; Klaus Piglmayer; Johannes Heitz

doi:10.1117/12.541052

18 November 2003 Laser-induced single step micro/nanopatterning

Dieter Baeuerle, Gerard Wysocki, Lars Landstroem, Johannes Klimstein, Klaus Piglmayer, Johannes Heitz

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.541052
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

Recent achievements in laser-induced surface patterning obtained in our group are summarized. Here, we have employed both a SNOM-type setup and two-dimensional lattices of SiO₂ microspheres formed by self-assembly processes. With the SNOM-type setup we have demonstrated nanoscale photochemical and photothermal etching, mainly of Si in Cl₂ atmosphere. With 2D lattices of microspheres a large number of single features can be generated by a single or a few laser shots. Among the examples presented is the surface patterning by ablation, etching, deposition, and surface modification.

Citation Download Citation

Dieter Baeuerle, Gerard Wysocki, Lars Landstroem, Johannes Klimstein, Klaus Piglmayer, and Johannes Heitz "Laser-induced single step micro/nanopatterning", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.541052

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