18 November 2003 Laser-induced single step micro/nanopatterning
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.541052
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
Recent achievements in laser-induced surface patterning obtained in our group are summarized. Here, we have employed both a SNOM-type setup and two-dimensional lattices of SiO2 microspheres formed by self-assembly processes. With the SNOM-type setup we have demonstrated nanoscale photochemical and photothermal etching, mainly of Si in Cl2 atmosphere. With 2D lattices of microspheres a large number of single features can be generated by a single or a few laser shots. Among the examples presented is the surface patterning by ablation, etching, deposition, and surface modification.
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Dieter Baeuerle, Dieter Baeuerle, Gerard Wysocki, Gerard Wysocki, Lars Landstroem, Lars Landstroem, Johannes Klimstein, Johannes Klimstein, Klaus Piglmayer, Klaus Piglmayer, Johannes Heitz, Johannes Heitz, } "Laser-induced single step micro/nanopatterning", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.541052; https://doi.org/10.1117/12.541052
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