18 November 2003 Model for pulsed ultraviolet laser ablation
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540528
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
A theoretical model for laser ablation of polymers is developed. The model includes the description of radiation transport processes for the two-photon stepwise absorption of chromophores. This processes results in a nonlinear loss for the laser fluence, which can be expressed in term of the effective absorption coefficient αeff. The behavior of αeff as a function of incident fluence, applied wavelength, linear, excited state and plume absorption cross sections will be analyzed. This model accounts for a wide variety of observations such as fluence thresholds, wavelength and fluence dependent etch rates. An expression for the etch depth as a function of incident fluence is derived. It will be shown that the theoretical analysis describes accurately the trend of the noval photopolymers ablation results, which are recently reported in literature.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Mansour, K. Jamshidi Ghaleh, "Model for pulsed ultraviolet laser ablation", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540528; https://doi.org/10.1117/12.540528
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