18 November 2003 Model for pulsed ultraviolet laser ablation
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540528
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
A theoretical model for laser ablation of polymers is developed. The model includes the description of radiation transport processes for the two-photon stepwise absorption of chromophores. This processes results in a nonlinear loss for the laser fluence, which can be expressed in term of the effective absorption coefficient αeff. The behavior of αeff as a function of incident fluence, applied wavelength, linear, excited state and plume absorption cross sections will be analyzed. This model accounts for a wide variety of observations such as fluence thresholds, wavelength and fluence dependent etch rates. An expression for the etch depth as a function of incident fluence is derived. It will be shown that the theoretical analysis describes accurately the trend of the noval photopolymers ablation results, which are recently reported in literature.
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N. Mansour, N. Mansour, K. Jamshidi Ghaleh, K. Jamshidi Ghaleh, } "Model for pulsed ultraviolet laser ablation", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540528; https://doi.org/10.1117/12.540528
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