18 November 2003 Preparation of channel waveguides with extremely thermally stabilized laser-induced gratings
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540896
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
Waveguide filters with extremely thermally stabilized KrF laser-induced gratings were fabricated in the highly photosensitive Ge-B-SiO2 thin films. It was discovered that a completely new-type grating with high diffraction efficiency and thermal stability could be formed by annealing a conventional laser-induced grating at 600°C. Such thermally induced gratings couldn't be erased after repeated heat treatment alternating between room temperature and 600°C. We printed a grating in slab waveguide by irradiation with a KrF excimer laser followed by the annealing at 600°C, and then formed the channel in the region of the grating using standard photolithography process. The diffraction peak of 17 dB in depth at 1535.04 nm wavelength was observed after repeated heat treatment alternating between room temperature and 400°C. These thermally stabilized waveguide filters are promising candidate for the highly reliable optical and sensing devices.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroaki Nishiyama, Hiroaki Nishiyama, Tomokazu Sano, Tomokazu Sano, Etsuji Ohmura, Etsuji Ohmura, Isamu Miyamoto, Isamu Miyamoto, Shin-ichi Matsumoto, Shin-ichi Matsumoto, Mitsunori Saito, Mitsunori Saito, Kenji Kintaka, Kenji Kintaka, Junji Nishii, Junji Nishii, } "Preparation of channel waveguides with extremely thermally stabilized laser-induced gratings", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540896; https://doi.org/10.1117/12.540896
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