18 November 2003 Process assembly for μm-scale SLS, reaction sintering, and CVD
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003); doi: 10.1117/12.540466
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
A novel device suited for the generation of sintered microparts of metal and ceramics, for reaction sintering and for CVD has been developed and successfully tested. With the production of a functional component it has evidenced professional performance. The set-up is vacuum tight; unstable substances can be processed under various shield gases and pressures; it is equipped with a device suited to rake thin layers of fine powders as well as slurries. Sub micrometer powder can be processed in steps of 1 μm thick sintered layers. In combination with a proprietary sintering regime, micro parts with a structural resolution of <30μm, and aspect ratios of >10 have been achieved.
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Robby Ebert, Peter Regenfuss, Sascha Kloetzer, Lars Hartwig, Horst Exner, "Process assembly for μm-scale SLS, reaction sintering, and CVD", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540466; https://doi.org/10.1117/12.540466
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KEYWORDS
Laser sintering

Metals

Ceramics

Chemical vapor deposition

Tungsten

Gases

Solids

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