18 November 2003 Surface microstructuring of transparent materials by laser-induced backside wet etching using excimer laser
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540486
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
Silica glass is an important material in optics and optoelectronics because of its outstanding properties, such as transparence in a wide wavelength range, strong damage resistance for laser irradiation, and high chemical stability. In order to develop simpler processes of micro-fabricating silica glass using a pulsed laser, we have investigated a one-step method to microfabricate a silica glass plate using laser-induced backside wet etching (LIBWE) upon irradiation with a ns-pulsed excimer laser. Our idea of LIBWE is based on the deposition of laser energy on the surface of silica glass using ablation of a dye solution. When the dye solution was ablated upon the laser irradiation, the etching of a surface layer was performed on the silica glass. We have succeeded in the micro-fabrication of such transparent materials as silica glass, quartz, calcium fluoride, sapphire and fluorocarbon resin. The advantages of our LIBWE method are as follows, (1) a lwo laser fluence and constant etch rate, (2) microfabrication without debris and cracks formation, (3) large area irradiation with an excimer laser beam through a mask projection, (4) simple pre/post-treatment on target substrates. This is a one-step process simpler method at ambient pressure, which would be used for mass production.
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Hiroyuki Niino, Ximing Ding, Ryozo Kurosaki, Aiko Narazaki, Tadatake Sato, Yoshizo Kawaguchi, "Surface microstructuring of transparent materials by laser-induced backside wet etching using excimer laser", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540486; https://doi.org/10.1117/12.540486
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