18 November 2003 Transcriptional ablation using femtosecond laser with mask
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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540518
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
Mask patterns in the shape of lines were transferred on gold thin films by laser ablation using femtosecond laser and a photo-lithographic optical system. A laser beam passed through a mask and the pattern was imaged on the film by a pair of convex lenses. As a result, the film was lithographically ablated, and microsized patterns were generated in a single shot. Fringes were generated outside the ablated patterns with defocusing or larger laser fluence. The resolution of generation was 13 μm, and the narrowest width of a generated line was about 4 μm actually.
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Yoshiki Nakata, Yoshiki Nakata, Tatsuo Okada, Tatsuo Okada, Mitsuo Maeda, Mitsuo Maeda, } "Transcriptional ablation using femtosecond laser with mask", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540518; https://doi.org/10.1117/12.540518
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