16 September 2003 Electron beam mastering process realizing over 100-GB/layer capacity disc
Author Affiliations +
Proceedings Volume 5069, Optical Data Storage 2003; (2003) https://doi.org/10.1117/12.533039
Event: Optical Data Storage 2003, 2003, Vancouver, Canada
Abstract
We have demonstrated the capability of 100GB density recording by the electron beam mastering and readout by a near-field optical pick-up with an effective NA of 2.05 and a blue LD of 405 nm wavelength. The Si disc of 100GB density was fabricated by the optimized Si etching process condition to form suitable pit pattern shape for the near-field readout.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Minoru Takeda, Minoru Takeda, Motohiro Furuki, Motohiro Furuki, Masanobu Yamamoto, Masanobu Yamamoto, Masataka Shinoda, Masataka Shinoda, Kimihiro Saito, Kimihiro Saito, Yuichi Aki, Yuichi Aki, Hiroshi Kawase, Hiroshi Kawase, Mitsuru Koizumi, Mitsuru Koizumi, Toshiaki Miyokawa, Toshiaki Miyokawa, Masao Mutou, Masao Mutou, } "Electron beam mastering process realizing over 100-GB/layer capacity disc", Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); doi: 10.1117/12.533039; https://doi.org/10.1117/12.533039
PROCEEDINGS
6 PAGES


SHARE
Back to Top