16 September 2003 Improvement of near-field mastering with a 266-nm laser
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Proceedings Volume 5069, Optical Data Storage 2003; (2003) https://doi.org/10.1117/12.532755
Event: Optical Data Storage 2003, 2003, Vancouver, Canada
Near-field mastering process with a 266 nm laser was improved in the stability for long time exposure and in the performance for ROM exposure. The exposure stability was achieved by using a chemically amplified type photoresist and by setting the air gap large. The exposure performance was achieved by reducing the aberration of the objective lens and by adjusting the focal position precisely. As a result, 100 nm narrow width was obtained in the groove structure, and good signal quality was obtained from a 25 gigabyte (GB) read only memory (ROM) disc. A full area exposure for a 25 GB ROM disc was also achieved.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shingo Imanishi, Shingo Imanishi, Minoru Takeda, Minoru Takeda, Masanobu Yamamoto, Masanobu Yamamoto, Nobuhiko Mukai, Nobuhiko Mukai, Katsuji Takagi, Katsuji Takagi, Toshiyuki Kono, Toshiyuki Kono, "Improvement of near-field mastering with a 266-nm laser", Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); doi: 10.1117/12.532755; https://doi.org/10.1117/12.532755

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