16 May 2003 Quantum lithography
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Proceedings Volume 5111, Fluctuations and Noise in Photonics and Quantum Optics; (2003) https://doi.org/10.1117/12.497420
Event: SPIE's First International Symposium on Fluctuations and Noise, 2003, Santa Fe, New Mexico, United States
Abstract
We show how to beat the `fundamental' noise limits in optical lithography using entangled quantum states. In this talk we will give the theoretical background to optical lithography and its quantum formulation. A proof-in-principle experimental demonstration is described.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Samuel L. Braunstein, Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Colin P. Williams, Jonathan P. Dowling, "Quantum lithography", Proc. SPIE 5111, Fluctuations and Noise in Photonics and Quantum Optics, (16 May 2003); doi: 10.1117/12.497420; https://doi.org/10.1117/12.497420
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