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24 April 2003 Matching different size mask to improve stepper throughput effectively
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Abstract
Color filter process is after passivation layer technology. Front end wafers may be produced by different size masks. For example, if front end stepper were 5" mask system, but color filter production line is 6 " mask, throughput will be very slow (6" mask but is 5" layout). Different foundries used different size masks & stepping systems (avoid guard ring) for production caused more complicated for different size masks matching. Color process use high energy, so may impact stepper throughput & Lens quality also. Improve throughput & prolong Lens life are very important for production. Using the matching system we can improve stepper (Example: 5"layout changed to 6" layout on 6" mask) throughput effectively & prolong ASML lens life.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fu-Tien Weng, Hung-Jen Hsu, Chih-Kung Chang, and Yu-Kung Hsiao "Matching different size mask to improve stepper throughput effectively", Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); https://doi.org/10.1117/12.501442
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