Matching different size masks to effectively improve stepper throughput

Fu-Tien Weng; Hung-Jen Hsu; Chih-Kung Chang; Yu-Kung Hsiao

doi:10.1117/12.501442

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24 April 2003 Matching different size mask to improve stepper throughput effectively

Fu-Tien Weng; Hung-Jen Hsu; Chih-Kung Chang; Yu-Kung Hsiao

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Proceedings Volume 5116, Smart Sensors, Actuators, and MEMS; (2003) https://doi.org/10.1117/12.501442
Event: Microtechnologies for the New Millennium 2003, 2003, Maspalomas, Gran Canaria, Canary Islands, Spain

Abstract

Color filter process is after passivation layer technology. Front end wafers may be produced by different size masks. For example, if front end stepper were 5" mask system, but color filter production line is 6 " mask, throughput will be very slow (6" mask but is 5" layout). Different foundries used different size masks & stepping systems (avoid guard ring) for production caused more complicated for different size masks matching. Color process use high energy, so may impact stepper throughput & Lens quality also. Improve throughput & prolong Lens life are very important for production. Using the matching system we can improve stepper (Example: 5"layout changed to 6" layout on 6" mask) throughput effectively & prolong ASML lens life.

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Fu-Tien Weng, Hung-Jen Hsu, Chih-Kung Chang, and Yu-Kung Hsiao "Matching different size mask to improve stepper throughput effectively", Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); https://doi.org/10.1117/12.501442

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