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24 April 2003 Soft lithographic patterning of oxide thin films
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Proceedings Volume 5116, Smart Sensors, Actuators, and MEMS; (2003) https://doi.org/10.1117/12.499780
Event: Microtechnologies for the New Millennium 2003, 2003, Maspalomas, Gran Canaria, Canary Islands, Spain
Abstract
An emerging non-photolithographic technology, soft lithography, is applied with the aim of patterning ferroelectric thin film oxides, in particular sol-gel deposited Lead Zirconate Titanate (PZT). Soft lithography relies on the replication of a patterned master using an elastomeric material and then, using this as a stamp to create micro- and nanometer scale patterns and structures. Following this procedure, a set of masters were fabricated both using photolithographic and Focused Ion Beam (FIB) methods. Masters were replicated using a commercial polymer (PDMS), satisfactorily reproducing the negative of the master’s features down to a limit of 500 nm. The obtained stamps were used to produce patterned self-assembled monolayers (SAMs) of alkanethiols over surfaces of gold, using the technique of microcontact printing (mCP). The patterned SAMs were then employed as a molecular thin resist to create microstructures of gold by wet etching. This is a key step for establishing a new route for the fabrication of ferroelectric thin film capacitors made of Pt/PZT/Au by Reactive Ion Etching (RIE) using the patterned gold features as both mask and top electrode, thus avoiding alignment stages in the fabrication procedure.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Estefania Abad, Roger W. Whatmore, Qi Zhang, and Zhaorong Huang "Soft lithographic patterning of oxide thin films", Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); https://doi.org/10.1117/12.499780
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