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10 November 2003 Development of 5-kHz ultra-line-narrowed F2 laser for dioptric projection system
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Proceedings Volume 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2003) https://doi.org/10.1117/12.515510
Event: XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2002, Wroclow, Poland
Abstract
The roadmap of semiconductor fabrication predicts that the semiconductor market will demand 65 nm node devices from 2004/2005. Therefore, an Ultra-Line-Narrowed F2 laser for dioptric projection systems has been developed under the ASET project of “The F2 Laser Lithography Development Project”. The target of this project is to achieve a F2 laser spectral bandwidth below 0.2 pm (FWHM) and an average power of 25 W at a repetition rate of 5 kHz. The energy stability (3-sigma) target is less than 10%. Simultaneously, it is also required to establish the technology of evaluating the optical performance. An Oscillator-Amplifier arrangement at 2 kHz was developed as a first step of an Ultra-Line-Narrowed F2 laser system. With this laser system, we achieved the basic study of the synchronization technology for line narrowing operation using two system arrangements: MOPA (Master Oscillator/Power Amplifier) and Injection Locking. Based on this experience we have developed the 5 kHz system. With the 5 kHz Line-Narrowed Injection Locking system, we have achieved a spectral bandwidth of <0.2 pm with an output energy of >5 mJ and a pulse to pulse energy stability of <10%. The feasibility of a 5 kHz Ultra-Line-Narrowed F2 Laser for Dioptric Projection Systems has been demonstrated.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hakaru Mizoguchi, Ryoichi Nohdomi, Tatsuya Ariga, Kazuaki Hotta, Kiyoharu Nakao, and Koichi Kasuya "Development of 5-kHz ultra-line-narrowed F2 laser for dioptric projection system", Proc. SPIE 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (10 November 2003); doi: 10.1117/12.515510; https://doi.org/10.1117/12.515510
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