High-power RF-excited planar waveguide carbon dioxide lasers for microprocessing applications

Denis R. Hall; H. J. Baker; F. Villarreal

doi:10.1117/12.515452

10 November 2003 High-power RF-excited planar waveguide carbon dioxide lasers for microprocessing applications

Denis R. Hall, H. J. Baker, F. Villarreal

Proceedings Volume 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2003) https://doi.org/10.1117/12.515452
Event: XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2002, Wroclow, Poland

Abstract

We review progress in the development of a novel mode of operation of the planar waveguide carbon dioxide laser (referred to as the ultra-super-pulse or USP mode), which is capable of delivering, at high efficiency, up to ten times higher peak power and up to ten times shorter pulse duration than the 'conventional' planar waveguide laser. These enhanced bream properties extend the range of applications to the micro-processing of materials with higher machining threshold and/or low absorption coefficients and with the added advantage of producing reduced heat affected zone.

Citation Download Citation

Denis R. Hall, H. J. Baker, and F. Villarreal "High-power RF-excited planar waveguide carbon dioxide lasers for microprocessing applications", Proc. SPIE 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (10 November 2003); https://doi.org/10.1117/12.515452

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