10 November 2003 Novel pulse-repetitive technological CO2 laser for nano-powders and thin film production
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Proceedings Volume 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2003) https://doi.org/10.1117/12.515839
Event: XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2002, Wroclow, Poland
Abstract
The paper reports about a new pulse-repetitive high-efficient technological CO2-laser and its applications. An original method of active medium excitation was used for laser pumping. Efficiency of the laser constructed on the basis of this method reached 12%, average radiation power 600 W, pulse power ~ 10 kW. The laser was used for YSZ powders production by successive evaporation and crystallization in the gas stream. The output rate was 15-20g/h, specific surface of the powder was up to 70m2/g. Evaporation of materials by CO2 laser was also used for ZrO2 and Al2O3 thin films deposition on stainless steel plates. The average thickness of the film was ~500nm, the deposition rate was ~10nm on the area ~1cm2 per pulse. The deposited films have high adhesion properties.
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M. G. Ivanov, M. G. Ivanov, V. V. Osipov, V. V. Osipov, V. V. Platonov, V. V. Platonov, V. V. Lisenkov, V. V. Lisenkov, Y. A. Kotov, Y. A. Kotov, } "Novel pulse-repetitive technological CO2 laser for nano-powders and thin film production", Proc. SPIE 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (10 November 2003); doi: 10.1117/12.515839; https://doi.org/10.1117/12.515839
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