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Two carbonyls of transition-metal Mo(CO)6 and Fe(CO)5 were used for laser chemical vapor deposition (LCVD) of elements under the action of KrF-laser radiation (λL= 248 nm) and Ar+-laser radiation (λL= 448 nm) on SiO2 and Si substrate surface. The rate constant of heterogeneous reaction of Mo atoms deposition was K(T)≅1.1x106 cm/s at Mo(CO)6 vapor pressure of 0.1 Torr and KrF-laser power density of 1.9x107 W/cm2 while irradiating SiO2 substrate surface. The same rate constant of Fe atoms deposition was K(T)≅3.4x106 cm/s at Fe(CO)5 vapor pressure of 5 Torr and KrF-laser power density of 3.0x106 W/cm2 while irradiating SiO2 substrate surface. This rate constant was K(T)≅1.2x10-3cm/s and 2.8x10-3cm/s at Fe(CO)5 vapor pressure of 5 Torr and Ar+-laser power density of 102 W/cm2 while irradiating Si and SiO2 substrate surface accordingly. Kinetic data of atomic concentrations demonstrated that during of the initial stage of element deposition the content of deposited films reflects mainly chemical processes on the substrate surface and as irradiation time is being increased, the composition of films reflects mainly gas phase processes above the substrate surface.
Sergay A. Mulenko
"Laser-induced heterogeneous processes at deposition of elements from vapors of transition-metal carbonyles", Proc. SPIE 5121, Laser Processing of Advanced Materials and Laser Microtechnologies, (2 September 2003); https://doi.org/10.1117/12.515614
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Sergay A. Mulenko, "Laser-induced heterogeneous processes at deposition of elements from vapors of transition-metal carbonyles," Proc. SPIE 5121, Laser Processing of Advanced Materials and Laser Microtechnologies, (2 September 2003); https://doi.org/10.1117/12.515614