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2 September 2003 UV-laser-induced photolysis and desorption of molecules adsorbed on transparent substrates
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Proceedings Volume 5121, Laser Processing of Advanced Materials and Laser Microtechnologies; (2003) https://doi.org/10.1117/12.513803
Event: Laser Processing of Advanced Materials and Laser Microtechnologies, 2002, Moscow, Russian Federation
Abstract
Dissociation and desorption of physisorbed on a transparent fused quartz surface halogenomethane molecules induced by their absorption of UV excimer laser radiation have been investigated. The desorption has occurred to be a nonlinear photoprocess. It required from 5 to 7 UV photons, which were not absorbed simultaneously. A desorption mechanism based on excitation of adsorption bond in course of several cycles of one-photon absorption followed by electron-vibrational relaxation has been proposed. Then the one-photon absorption spectra of these adsorbed molecules should be spread to much longer wavelengths compared with that of the gaseous species. A one-photon dissociation has taken place only for halogenomethane molecules that could be photolyzed by such excimer lasers in gaseous phase. A multiple photon dissociation of some molecules has been observed as a result of direct multiphoton absorption, successive fragmentation or photolysis of vibrationally photoexcited species.
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Vladimir N. Varakin and Alexander P. Simonov "UV-laser-induced photolysis and desorption of molecules adsorbed on transparent substrates", Proc. SPIE 5121, Laser Processing of Advanced Materials and Laser Microtechnologies, (2 September 2003); https://doi.org/10.1117/12.513803
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