Deposition of carbonic films from plasma of arc discharge without a cathode spot

I. Gasanov; I. Gurbanov

doi:10.1117/12.517370

30 September 2003 Deposition of carbonic films from plasma of arc discharge without a cathode spot

I. Gasanov, I. Gurbanov

Proceedings Volume 5126, 17th International Conference on Photoelectronics and Night Vision Devices; (2003) https://doi.org/10.1117/12.517370
Event: 2003 Chapter books, 2003, Bellingham, WA, United States

Abstract

PVD ways of synthesis of hydrogen-free diamond-like films with high speed of a deposition of particles are analyzed. The technique of obtaining of coatings by means of a vacuum - arc discharge and of a plasma-optical filter provide the highest characteristics of -C amorphous diamond. However, the given way of synthesis is unwieldy and requires considerable costs. The capability of creation of the reactor of carbonic plasma in discharge with electron-beam heating of the cathode is consider. The control of power, entered into the graphitic cathode, allows essentially to limit a dispersion of an evaporated material.

Citation Download Citation

I. Gasanov and I. Gurbanov "Deposition of carbonic films from plasma of arc discharge without a cathode spot", Proc. SPIE 5126, 17th International Conference on Photoelectronics and Night Vision Devices, (30 September 2003); https://doi.org/10.1117/12.517370

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