Paper
10 October 2003 Sputtering of Ni and Ni3Al(111) surfaces under cluster bombardment: a molecular dynamics study
Evgeni E. Zhurkin, Anton S. Kolesnikov
Author Affiliations +
Proceedings Volume 5127, Sixth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (2003) https://doi.org/10.1117/12.517946
Event: Sixth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 2002, St. Petersburg, Russian Federation
Abstract
Sputtering of Ni and Ni3Al(111) surfaces induced by impact of AlN and NiN (N=1÷55) clusters with energies of 500 eV/atom is studied at atomic scale by means of classifical molecular dynamics (MD). The MD code we used implements many-body tight binding potential spliced to ZBL at short distances. We used relatively large computation cells (containing from 32,000 up to 256,000 atoms) with periodic and damped boundary conditions as well as long simulation times (up to 25 ps) and representaive statistics (up to 1000 runs per each case). Total sputtering yields, emission spectrums, and preferential sputtering features are analyzed, both in the linear and non-linear regimes.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Evgeni E. Zhurkin and Anton S. Kolesnikov "Sputtering of Ni and Ni3Al(111) surfaces under cluster bombardment: a molecular dynamics study", Proc. SPIE 5127, Sixth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (10 October 2003); https://doi.org/10.1117/12.517946
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Sputter deposition

Chemical species

Nickel

Picosecond phenomena

Computer simulations

Crystals

Monte Carlo methods

Back to Top