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10 October 2003Sputtering of Ni and Ni3Al(111) surfaces under cluster bombardment: a molecular dynamics study
Sputtering of Ni and Ni3Al(111) surfaces induced by impact of AlN and NiN (N=1÷55) clusters with energies of 500 eV/atom is studied at atomic scale by means of classifical molecular dynamics (MD). The MD code we used implements many-body tight binding potential spliced to ZBL at short distances. We used relatively large computation cells (containing from 32,000 up to 256,000 atoms) with periodic and damped boundary conditions as well as long simulation times (up to 25 ps) and representaive statistics (up to 1000 runs per each case). Total sputtering yields, emission spectrums, and preferential sputtering features are analyzed, both in the linear and non-linear regimes.
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Evgeni E. Zhurkin, Anton S. Kolesnikov, "Sputtering of Ni and Ni3Al(111) surfaces under cluster bombardment: a molecular dynamics study," Proc. SPIE 5127, Sixth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (10 October 2003);