Actinic aerial image measurement tool for 157-nm lithography

Peter Kuschnerus; Thomas Engel; Axel M. Zibold; Claudia Hertfelder; Takashi Yasui; Iwao Higashikawa; Christof M. Schilz; Armin Semmler

doi:10.1117/12.504064

28 August 2003 Actinic aerial image measurement tool for 157-nm lithography

Peter Kuschnerus, Thomas Engel, Axel M. Zibold, Claudia Hertfelder, Takashi Yasui, Iwao Higashikawa, Christof M. Schilz, Armin Semmler

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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504064
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

Carl Zeiss is currently in the final phase of an AIMS 157 development program in cooperation with Selete, Infineon and International SEMATECH. Based on Carl Zeiss' proven AIMS (Aerial Image Measurement System) technology, the new tool can optically emulate the aerial image generated in any given 157 nm scanner. Beta tools will be shipped throughout 2003. In this work the AIMS fab 157 hardware concept will be described. Latest measurements show that compared to first measurements CD repeatability and illumination uniformity could be significantly improved.

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Peter Kuschnerus, Thomas Engel, Axel M. Zibold, Claudia Hertfelder, Takashi Yasui, Iwao Higashikawa, Christof M. Schilz, and Armin Semmler "Actinic aerial image measurement tool for 157-nm lithography", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504064

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