28 August 2003 Actinic aerial image measurement tool for 157-nm lithography
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504064
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
Carl Zeiss is currently in the final phase of an AIMS 157 development program in cooperation with Selete, Infineon and International SEMATECH. Based on Carl Zeiss' proven AIMS (Aerial Image Measurement System) technology, the new tool can optically emulate the aerial image generated in any given 157 nm scanner. Beta tools will be shipped throughout 2003. In this work the AIMS fab 157 hardware concept will be described. Latest measurements show that compared to first measurements CD repeatability and illumination uniformity could be significantly improved.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Kuschnerus, Peter Kuschnerus, Thomas Engel, Thomas Engel, Axel M. Zibold, Axel M. Zibold, Claudia Hertfelder, Claudia Hertfelder, Takashi Yasui, Takashi Yasui, Iwao Higashikawa, Iwao Higashikawa, Christof M. Schilz, Christof M. Schilz, Armin Semmler, Armin Semmler, } "Actinic aerial image measurement tool for 157-nm lithography", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504064; https://doi.org/10.1117/12.504064
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