28 August 2003 CAR blanks performance for advanced reticle fabrication
Author Affiliations +
Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504183
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
DUV (Deep Ultra-Violet) laser reticle writers were released to the market for advanced reticle fabrication in 2002, AZ-DX1100P resist (for KrF lithography) has historically been employed for these tools. To respond to further high-end requirements, a new resist more friendly to DUV reticle fabrication is needed. FEP171 is a positive-type CAR (Chemically amplified resist) developed for EB reticle fabrication, which is sensitive to DUV as well. In this paper, we have investigated the applicability of FEP171-coated blanks for DUV reticle fabrication. As the results show, FEP171 could achieve 200 nm patterns by DUV exposure. FEP171 blanks showed superior performance in resolution and profile as compared to AZ-DX1100P. FEP171 blanks are promising for DUV reticle fabrication as well as EB reticle fabrication.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masahiro Hashimoto, Yasunori Yokoya, Takao Higuchi, Fumiko Ohta, Shouichi Kawashima, Yasushi Ohkubo, "CAR blanks performance for advanced reticle fabrication", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504183; https://doi.org/10.1117/12.504183
PROCEEDINGS
13 PAGES


SHARE
Back to Top