Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography

Motonari Tateno; Naohisa Takayama; Shingo Murakami; Keiichi Hatta; Shinji Akima; Fuyuhiko Matsuo; Masao Otaki; Byung-Gook Kim; Keishi Tanaka; Nobuyuki Yoshioka

doi:10.1117/12.504206

28 August 2003 Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography

Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki, Byung-Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka

Author Affiliations +

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504206
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

We have improved DUV laser reticle inspection system LM7000 for 90 nm technology node devices. To increase inspection sensitivity, we developed a reflected light inspection as a supplementary method to transmittance light inspection. We have also strengthened inspection algorithm to distinguish between real defects and very small features from optical proximity effect correction (OPC). Finally, we have improved reference image for die to database inspection. With the merit of short wavelength of LM7000 (266 nm), the inspection sensitivity of the high-transmittance half-tone phase shift mask (HTPSM) does not deteriorated so severely compared to that of binary mask. With the help of these series of improvements, LM7000 could shows inspection capability for OPC masks and HTPSM for ArF lithography. The inspection capability of LM7000 was proved with the programmed defect masks and printability experiment using ArF scanner.

Citation Download Citation

Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki, Byung-Gook Kim, Keishi Tanaka, and Nobuyuki Yoshioka "Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504206

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