28 August 2003 Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504206
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
We have improved DUV laser reticle inspection system LM7000 for 90 nm technology node devices. To increase inspection sensitivity, we developed a reflected light inspection as a supplementary method to transmittance light inspection. We have also strengthened inspection algorithm to distinguish between real defects and very small features from optical proximity effect correction (OPC). Finally, we have improved reference image for die to database inspection. With the merit of short wavelength of LM7000 (266 nm), the inspection sensitivity of the high-transmittance half-tone phase shift mask (HTPSM) does not deteriorated so severely compared to that of binary mask. With the help of these series of improvements, LM7000 could shows inspection capability for OPC masks and HTPSM for ArF lithography. The inspection capability of LM7000 was proved with the programmed defect masks and printability experiment using ArF scanner.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Motonari Tateno, Motonari Tateno, Naohisa Takayama, Naohisa Takayama, Shingo Murakami, Shingo Murakami, Keiichi Hatta, Keiichi Hatta, Shinji Akima, Shinji Akima, Fuyuhiko Matsuo, Fuyuhiko Matsuo, Masao Otaki, Masao Otaki, Byung-Gook Kim, Byung-Gook Kim, Keishi Tanaka, Keishi Tanaka, Nobuyuki Yoshioka, Nobuyuki Yoshioka, "Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504206; https://doi.org/10.1117/12.504206

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