28 August 2003 Inspection of aggressive OPC using aerial image-based mask inspection
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504058
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
Inspection of aggressive OPC represents one of the major challenges for today's mask inspection methodologies. Systems are phased with high-density layouts, containing OPC features far below the resolution limit of conventional inspection systems. This causes large amounts of false and nuisance defects, especially on production applications. The paper presents the use of Aera193, a new inspection system using aerial imaging as inspection methodology.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luke T. H. Hsu, Luke T. H. Hsu, Johnson Chang-Cheng Hung, Johnson Chang-Cheng Hung, Hong-Chang Hsieh, Hong-Chang Hsieh, Anja Rosenbusch, Anja Rosenbusch, Reuven Falah, Reuven Falah, Yuval Blumberg, Yuval Blumberg, } "Inspection of aggressive OPC using aerial image-based mask inspection", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504058; https://doi.org/10.1117/12.504058
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