28 August 2003 Mask technologies for metastable atom lithography: photomask and physical mask
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.507555
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
Using TEM copper grid with different pitch size as physical mask, alkanethiolates self-assembled monolayers was patterned by a metastable helium atom beam, demonstrating pattern transfer with nanoscale edge width to the underlying gold film. We found that the mask was reproduced as positive- or negative patterns with high fidelity, and the repetition of lithographic patterns was good in different runs.
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Xin Ju, Mitsunori Kurahashi, Taku Suzuki, Yasushi Yamauchi, "Mask technologies for metastable atom lithography: photomask and physical mask", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.507555; https://doi.org/10.1117/12.507555
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