On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori; Kazuya Iwase; Yoko Watanabe; Keiko Amai; Takayuki Sasaki; Shoji Nohama; Isao Ashida; Shigeru Moriya; Tetuya Kitagawa

doi:10.1117/12.504258

28 August 2003 On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa

Author Affiliations +

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504258
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

We propose the efficient on-site use of a 1x stencil mask for proximity electron lithography (PEL) for controlling image placement (IP) and critical dimension (CD). It has been demonstrated that the integrated approach to the IP-error correction on the mask-fabrication level using the data manipulation and the mask-exposure level using the deflection of an electron beam (EB) can meet the requirement for the overlay accuracy in the 65-nm technology node. Also, the time-dependent variation in mask CD due to EB-assisted contamination growth can be managed by using the combination of the dose control and the periodic dry cleaning of the mask.

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Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, and Tetuya Kitagawa "On-site use of 1x stencil mask: control over image placement and dimension", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504258

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