Pattern-dependence optical phase effect on alternating phase shift mask

Bin-Chang Chang; Jan-Wen You; Ming Lu; Chiu-Lien Lee; Li-Wei Kung; King-Chang Shu; Jaw-Jung Shin; Tsai-Sheng Gau; Burn-Jeng Lin

doi:10.1117/12.504284

28 August 2003 Pattern-dependence optical phase effect on alternating phase shift mask

Bin-Chang Chang, Jan-Wen You, Ming Lu, Chiu-Lien Lee, Li-Wei Kung, King-Chang Shu, Jaw-Jung Shin, Tsai-Sheng Gau, Burn-Jeng Lin

Author Affiliations +

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504284
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

A comprehensive study of alternating phase shifting mask (Alt-PSM) including mask making, 3-dimensional aerial image simulation, and wafer printing is reported in this paper. For the mask making, we found that the micro-loading effect will be greatly improved using the etching recipe with high Reactive Ion Etching (RIE) power and low Inductively Coupled Plasma (ICP) power. However, this recipe has side effects of Cr film damage and rough quartz side wall. Due to the 3-dimensional mask complex effect, the optimal phase difference is not simply π calculated using optical path difference but is varied with mask features. The optimal phase difference is 165° other than 180° for hole patterns, while it is 176° for line-and-space patterns. The micro-loading effect with variant 2-dimensional complexities is also studied in this paper.

Citation Download Citation

Bin-Chang Chang, Jan-Wen You, Ming Lu, Chiu-Lien Lee, Li-Wei Kung, King-Chang Shu, Jaw-Jung Shin, Tsai-Sheng Gau, and Burn-Jeng Lin "Pattern-dependence optical phase effect on alternating phase shift mask", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504284

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