28 August 2003 Photomask repeater strategy for high-quality and low-cost reticle fabrication
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504178
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
The severe mask specification makes mask cost increase drastically. Especially, the increase in the mask cost deals ASIC businesses a fatal blow due to its small chip volume per product. Pattern writing cost has always occupied the main part of the prime mask cost and the emphasis of this is still increasing. This paper reports on a Photomask Repeater strategy to be a solution for reducing mask cost in pattern writing, comparing with conventional EB system.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Suigen Kyoh, Soichi Inoue, Osamu Ikenaga, Tomotaka Higaki, Fumiaki Shigemitsu, Ichiro Mori, Haruo Kokubo, Naoya Hayashi, Nobuyuki Irie, Yuki Ishii, Toshikazu Umatate, "Photomask repeater strategy for high-quality and low-cost reticle fabrication", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504178; https://doi.org/10.1117/12.504178
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