26 September 2003 A new in situ method for testing the optical thickness of removed transparent elements
Author Affiliations +
Proceedings Volume 5134, Current Research on Holography and Interferometric Methods for Measurement of Object Properties: 2000-2002; (2003) https://doi.org/10.1117/12.518185
Event: Holography and Interferometric Methods for Measurement of Object Properties: 2000-2002, 2000, Unknown, United States
Abstract
A new remote method for a fast inspection of the optical thickness of transparent elements is developed. The method is based on the use of an high order interference of white light reflected from the sample's sides. Method gives a possibility for in situ measuring the optical thickness of the sample with accuracy to ~0.5 nm on aperture before 100mm and distance as far as some meters.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Iliya Emeliyanovich Kozhevatov, Iliya Emeliyanovich Kozhevatov, Evgeny A. Rudenchik, Evgeny A. Rudenchik, Nikolai P. Cheragin, Nikolai P. Cheragin, Elena H. Kulikova, Elena H. Kulikova, } "A new in situ method for testing the optical thickness of removed transparent elements", Proc. SPIE 5134, Current Research on Holography and Interferometric Methods for Measurement of Object Properties: 2000-2002, (26 September 2003); doi: 10.1117/12.518185; https://doi.org/10.1117/12.518185
PROCEEDINGS
4 PAGES


SHARE
Back to Top