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30 May 2003 Performance improvement of CGHs for optical testing
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The expansion of the field of diffractive optics applications is accompanied by toughening performance requirements for CGHs. Optical testing sets especially high requirements, concerning wavefront accuracy and diffraction efficiency. The key point in fabrication technology is the writing system creating the photomask or the profiled pattern. The diffractive optics fabrication facility at ITO (University of Stuttgart) is based on the circular laser writing system CLWS-300. This flexible and high-accurate tool was originally designed for binary diffractive optics fabrication. This paper presents novel enhancements of this system allowing direct laser writing of a wide range of binary and continuous-relief CGHs on photoresist layers, chromium films and LDW-glass. Main topics of the enhancements were the scanning accuracy and exposure control. Many types of CGHs (binary precision holograms for optical testing, Shack-Hartmann arrays, microlens discs for confocal microscopy, diffractive interferometer objectives, doughnut generators etc.) have been manufactured using the developed algorithms and hardware.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christof Pruss, Stephan Reichelt, Victor P. Korolkov, Wolfgang Osten, and Hans J. Tiziani "Performance improvement of CGHs for optical testing", Proc. SPIE 5144, Optical Measurement Systems for Industrial Inspection III, (30 May 2003);

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