14 November 2003 Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication
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Proceedings Volume 5147, ALT'02 International Conference on Advanced Laser Technologies; (2003) https://doi.org/10.1117/12.543706
Event: ALT'02 International Conference on Advanced laser Technologies, 2002, Adelboden, Switzerland
We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 μm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Crunteanu, Markus Pollnau, G. Janchen, C. Hibert, Patrik Hoffmann, Rene-Paul Salathe, Robert William Eason, David P. Shepherd, "Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication", Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); doi: 10.1117/12.543706; https://doi.org/10.1117/12.543706

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