14 November 2003 Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication
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Proceedings Volume 5147, ALT'02 International Conference on Advanced Laser Technologies; (2003) https://doi.org/10.1117/12.543706
Event: ALT'02 International Conference on Advanced laser Technologies, 2002, Adelboden, Switzerland
Abstract
We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 μm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Crunteanu, A. Crunteanu, Markus Pollnau, Markus Pollnau, G. Janchen, G. Janchen, C. Hibert, C. Hibert, Patrik Hoffmann, Patrik Hoffmann, Rene-Paul Salathe, Rene-Paul Salathe, Robert William Eason, Robert William Eason, David P. Shepherd, David P. Shepherd, } "Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication", Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); doi: 10.1117/12.543706; https://doi.org/10.1117/12.543706
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