14 November 2003 Pulsed laser deposition of advanced materials
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Proceedings Volume 5147, ALT'02 International Conference on Advanced Laser Technologies; (2003) https://doi.org/10.1117/12.543664
Event: ALT'02 International Conference on Advanced laser Technologies, 2002, Adelboden, Switzerland
Abstract
Pulsed-laser deposition is a unique technique that has been employed for thin film growth of a broad variety of materials. Tuning of deposition parameters allows to produce advanced thin films with optimized materials properties. We report on the deposition and characterization of various kinds of high-temperature superconducting thin films and of ceramic/polymer composite layers.
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Johannes D. Pedarnig, Johannes D. Pedarnig, I. Vrejoiu, I. Vrejoiu, M. Peruzzi, M. Peruzzi, M. P. Delamare, M. P. Delamare, Dieter Bauerle, Dieter Bauerle, } "Pulsed laser deposition of advanced materials", Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); doi: 10.1117/12.543664; https://doi.org/10.1117/12.543664
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