28 May 2003 Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool
Author Affiliations +
Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.515107
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany
Abstract
Besides the metrology performance of a CD measurement tool, its close integration into a manufacturing environment becomes more and more important. This is extremely driven by the ever increasing complexity of masks and their tightening specifications. Hence, this calls for the capability of fully automated CD measurements on a large number of dense and isolated lines and 2-dimensional features under production conditions. In this paper we report on such a highly automated measurement system for CD measurements from MueTec. Either an ASCII software interface or a specially developed software interface to connect the MueTec with the CATSTM mask data fracturing software handles the large amount of co-ordinates and other information like design images from the measurement sites and their surrounding, which are necessary for fully automated CD measurements. Because the latter is the standard in mask-making and data-formats, this level of automation guarantees a good industrial integration of the MueTec system. Fully automated and reliable CD measurements are based on very stable tool hardware and especially on a positioning stage with best possible positioning accuracy (range better 0.5 ?m), significantly improved possibilities of software controlled positioning and an automated job set up and execution. The time gain in relation to existing measurement programs in the extent of supply has turned out to be dramatically large. The User Interfaces and their applications will be described.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerd Scheuring, Alexander Petrashenko, Stefan Doebereiner, Frank Hillmann, Hans-Jurgen Bruck, Andrew C. Hourd, Anthony Grimshaw, Gordon Hughes, Shiuh-Bin Chen, Parkson W. Chen, Thomas Schatz, Thomas Struck, Paul J. M. van Adrichem, Herman Boerland, Sigrid Lehnigk, "Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515107; https://doi.org/10.1117/12.515107
PROCEEDINGS
10 PAGES


SHARE
Back to Top