Translator Disclaimer
28 May 2003 Through the looking glass: what is on the horizon for the mask maker?
Author Affiliations +
Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.514946
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany
Abstract
The future of mask industry technology is in flux. While the requirements for current and near-term lithographic capability is well understood, advanced lithography options pose a completely new set of challenges to the mask maker. Challenges are not only process and materials related, but also include more fundamental concerns dealing with how to afford the necessary capability development. This paper identifies the issues and attempts to propose solutions to the industry's growing concerns.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Scott Mackay, Benjamin George Eynon Jr., and Dhirendra P. Mathur "Through the looking glass: what is on the horizon for the mask maker?", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); https://doi.org/10.1117/12.514946
PROCEEDINGS
5 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

EUV lithography: progress, challenges, and outlook
Proceedings of SPIE (October 16 2014)
Marching to the beat of Moore's Law
Proceedings of SPIE (March 23 2006)
Mask strategy at International SEMATECH
Proceedings of SPIE (August 15 2002)
Lithography strategy for 65-nm node
Proceedings of SPIE (July 31 2002)

Back to Top