28 May 2003 Ultrathin-membrane EPL masks
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Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.515090
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany
Abstract
Electron Projection Lithography ( EPL) is a leading candidate for the sub-65 nm lithography regime (1),(2). The development of a low-distortion mask is critical to the success of EPL. EPL has traditionally used either a stencil format mask with a single scatterer layer having the pattern represented by voids in the membrane (3), or a continuous membrane format mask with a patterned scatterer layer supported by an unperforated membrane(4).
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Greschner, T. Bayer, S. Kalt, H. Weiss, Phillip L. Reu, Roxann L. Engelstad, Obert R. Wood, Carey M. Thiel, Michael S. Gordon, Rajinder S. Dhaliwal, Christopher F. Robinson, Hans C. Pfeiffer, "Ultrathin-membrane EPL masks", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515090; https://doi.org/10.1117/12.515090
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