Paper
29 January 2004 Optical constants for hard x-ray multilayers over the energy range E = 35 - 180 keV
David L. Windt, Soizik Donguy, Charles J. Hailey, Jason E. Koglin, Veijo Honkimaki, Eric Ziegler, Finn E. Christensen, Fiona A. Harrison
Author Affiliations +
Abstract
We have determined experimentally optical constants for eight thin film materials that can be used in hard X-ray multilayer coatings. Thin film samples of Ni.97V.03, Mo, W, Pt, C, B4C, Si and SiC were deposited by magnetron sputtering onto superpolished optical flats. Optical constants were determined from fits to reflectance-vs-incidence angle measurements made using synchrotron radiation over the energy range E=35-180 keV. We have also measured the X-ray reflectance of a prototype W/SiC multilayer coating over the energy range E=35-100 keV, and we compare the measured reflectance with a calculation using the newly derived optical constants.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David L. Windt, Soizik Donguy, Charles J. Hailey, Jason E. Koglin, Veijo Honkimaki, Eric Ziegler, Finn E. Christensen, and Fiona A. Harrison "Optical constants for hard x-ray multilayers over the energy range E = 35 - 180 keV", Proc. SPIE 5168, Optics for EUV, X-Ray, and Gamma-Ray Astronomy, (29 January 2004); https://doi.org/10.1117/12.505886
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Cited by 15 scholarly publications.
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KEYWORDS
Multilayers

Reflectivity

Silicon carbide

Hard x-rays

Scattering

Silicon

Mirrors

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