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6 November 2003 Fabrication of optical elements with femtosecond doubled-frequency Ti:sapphire laser
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In fabrication of a fine optical element, femtosecond laser is an attractive experimental tool because it avoids the splutter effect to damage the nearby lines. However, the wavelength of the usual Ti:sapphire laser is insensitive to the widely-used photoresist in microlithographic industry. In this paper, we introduce a new method with femtosecond doubled-frequency laser by use of a BBO crystal to fabricate optical gratings and chromium photomasks. The laser source is the Ti:sapphire laser with a central wavelength of 790 nm and its doubled-frequency laser is obtained through the BBO crystal whose wavelength (395nm) is within the sensitive exposure range of the photoresist. This enables us to fabricate fine optical elements with the normal photolithographic technique. In the experiment, we use a translator that is controlled by a computer to accurately move for fabrication of optical elements with high precision. In contrast to the other techniques, our approach has the higher quality and precision, for femtosecond laser works faster than the material’s thermal diffusion, i.e., without splutter effect that yields the clear edge of the optical element. Moreover, it also makes the fabrication processing simplified. Experiments are given to verify that this method should be highly interesting for the fabrication of fine binary optical elements.
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Xiaohui Sun, Changhe Zhou, Peng Xi, Enwen Dai, Liren Liu, and Bingkun Yu "Fabrication of optical elements with femtosecond doubled-frequency Ti:sapphire laser", Proc. SPIE 5174, Novel Optical Systems Design and Optimization VI, (6 November 2003);

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